发明名称 Methods of Forming Memory Arrays and Semiconductor Constructions
摘要 Some embodiments include methods of forming semiconductor constructions. A heavily-doped region is formed within a first semiconductor material, and a second semiconductor material is epitaxially grown over the first semiconductor material. The second semiconductor material is patterned to form circuit components, and the heavily-doped region is patterned to form spaced-apart buried lines electrically coupling pluralities of the circuit components to one another. At least some of the patterning of the heavily-doped region occurs simultaneously with at least some of the patterning of the second semiconductor material.
申请公布号 US2015206886(A1) 申请公布日期 2015.07.23
申请号 US201414569337 申请日期 2014.12.12
申请人 Micron Technology, Inc. 发明人 Guha Jaydip;Surthi Shyam
分类号 H01L27/108;H01L29/04;H01L21/324;H01L21/02;H01L21/265;H01L29/66;H01L29/16 主分类号 H01L27/108
代理机构 代理人
主权项 1. A method of forming a memory array, comprising: providing a base comprising a first semiconductive material, the base having an memory array region and a peripheral region, an upper surface of the array region being recessed relative to uppermost surfaces of the base in the peripheral region; forming a heavily-doped region within the first semiconductor material in the array region; epitaxially growing a second semiconductor material over the first semiconductor material; the second semiconductor material being in situ doped during the epitaxial growth to form a stack of doped regions over the heavily-doped region; forming first trenches through the second semiconductor material; the first trenches extending along a first direction, and penetrating entirely through the heavily-doped region; forming second trenches through the second semiconductor material, the second trenches extending along a second direction which intersects the first direction, and not penetrating entirely through the heavily-doped region; the first and second trenches together patterning the second semiconductor material into a plurality of vertically-extending pillars comprising the stacked doped regions, and patterning the heavily-doped region into a plurality of buried lines under the pillars; the buried lines electrically interconnecting pluralities of the pillars to one another; and forming data storage devices over the vertically-extending pillars and electrically coupled with top doped regions of the stacked doped regions.
地址 Boise ID US