METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS

摘要

A method of designing an epitaxy template to direct self-assembly of a block copolymer on a substrate into an ordered target pattern involves providing a primary epitaxy template design and then varying the design to optimize a pattern fidelity statistic, such as placement error, relative to the target pattern by modelling predicted self-assembled block copolymer patterns and optimizing pattern placement as a function of a varied design parameter. In addition to varying a design parameter to optimize the pattern fidelity statistic, a random error in the template design is included prior to modelling predicted patterns in order to compensate for expected template inaccuracy in practice. The inclusion of a realistic random error in the template design, in addition to systematic variation of a design parameter, may improve the template design optimization to render the result less sensitive to error which may be inevitable in practice.

主权项

1. A method of designing an epitaxy template to direct self-assembly of a block copolymer into a target pattern on a substrate, the method comprising;
providing a primary epitaxy template design, and modifying the primary epitaxy template design to generate a final epitaxy template design, wherein self-assembly of the block copolymer directed by the final epitaxy template design provides an ordered pattern of self-assembled block copolymer, with an improved pattern fidelity statistic, relative to the target pattern, compared to the pattern fidelity statistic obtained when self-assembly is directed by the primary epitaxy template design, wherein the final epitaxy template design is derived by: modelling predicted ordered patterns of self-assembled block copolymer directed by modified epitaxy template designs generated from the primary epitaxy template design by systematically varying a design parameter in the modified epitaxy template designs, and optimizing the pattern fidelity statistic for the predicted ordered patterns of self-assembled block copolymer, relative to the target pattern, as a function of the varied design parameter for the modified epitaxy template designs, and wherein a random error is included in at least one of the epitaxy template designs prior to modelling predicted ordered patterns of self-assembled block copolymer.