发明名称 QUALITY CONTROL APPARATUS, QUALITY CONTROL METHOD, AND PROGRAM
摘要 A quality control apparatus is provided with: non-uniformity calculation means, which calculates non-uniformity of feature values related to positions or shapes that should be the same in different parts of an electronic component or bonding locations between an electronic component and a printed circuit board; assessment means, which assesses whether or not the non-uniformity is greater than or equal to a predetermined threshold; and parameter modification means which, if the non-uniformity is greater than or equal to the predetermined threshold, proposes a modification to a user regarding modifying a setting parameter for a solder printing apparatus or a mounter. For the non-uniformity, it is possible to adopt such a value as a difference or ratio between maximum values and minimum values for feature values which should normally be the same in different parts; for example, the non-uniformity can be with respect to such values as heights of electrodes or terminals, or solder lengths or solder angles.
申请公布号 WO2015107959(A1) 申请公布日期 2015.07.23
申请号 WO2015JP50265 申请日期 2015.01.07
申请人 OMRON CORPORATION 发明人 TANAKA MAYUKO;FUJII SHIMPEI;MORI HIROYUKI
分类号 H05K13/08;H05K3/34 主分类号 H05K13/08
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