发明名称 チップの両側からの段階的ビア形成
摘要 A method of fabricating a semiconductor assembly can include providing a semiconductor element having a front surface, a rear surface, and a plurality of conductive pads, forming at least one hole extending at least through a respective one of the conductive pads by processing applied to the respective conductive pad from above the front surface, forming an opening extending from the rear surface at least partially through a thickness of the semiconductor element, such that the at least one hole and the opening meet at a location between the front and rear surfaces, and forming at least one conductive element exposed at the rear surface for electrical connection to an external device, the at least one conductive element extending within the at least one hole and at least into the opening, the conductive element being electrically connected with the respective conductive pad.
申请公布号 JP5753904(B2) 申请公布日期 2015.07.22
申请号 JP20130529287 申请日期 2011.09.14
申请人 テッセラ,インコーポレイテッド 发明人 オガネシアン,ヴァーゲ;ハーバ,ベルガセム;モハメッド,イリヤス;ミッチェル,クレイグ;サヴァリア,ピーユーシュ
分类号 H01L21/3205;H01L21/768;H01L23/12;H01L23/522;H01L25/065;H01L25/07;H01L25/18 主分类号 H01L21/3205
代理机构 代理人
主权项
地址