发明名称 AN ELECTRODE PATTERN AND MANUFACTURING METHOD THEREOF
摘要 <p>The present invention relates to an electrode pattern and manufacturing method thereof, wherein the electrode pattern includes: a metal mesh structure layer; a first electrode layer located in a certain area of the metal mesh structure layer and containing a metal seed; and a substitution coating layer located in a certain area of the first electrode layer including the metal seed. The present invention uses an electricity radiation method to form the first electrode layer including multiple metal seeds between first or second metal lines in the metal mesh structure layer. Therefore, a nano based mesh line width can be formed by using the first electrode layers.</p>
申请公布号 KR20150084490(A) 申请公布日期 2015.07.22
申请号 KR20140004574 申请日期 2014.01.14
申请人 KOREA INSTITUTE OF MACHINERY & MATERIALS 发明人 CHOI, SUNG MOOK;LEE, JOO YUL;LIM, DONG CHAN;YIM, SEONG BONG;LIM, JAE HONG;LEE, SANG YEOUL;SONG, YOUNG SUP
分类号 G06F3/041 主分类号 G06F3/041
代理机构 代理人
主权项
地址
您可能感兴趣的专利