| 摘要 |
PROBLEM TO BE SOLVED: To provide a zinc oxide sintered compact from which a sputtering target of good shape accuracy can be obtained even not perform heat treatment or the like after processing, and from which a transparent film in which stable discharge is continuously possible also by a DC sputtering method and which has suitable insulation can be obtained.SOLUTION: When a zinc oxide powder in which the metal content other than zinc is less than 0.1% by weight, the BET specific surface area is 2-20 m/g, and the powder bulk density is 0.5-1.8 g/cmis fabricated, and calcinated, the calcination is performed such that the sintering temperature is 900-1,250°C, and a gas flow parameter is at least 8,000 under the inert atmosphere in which oxygen is at most 10 vol.%. Thereby, the zinc oxide sintered compact in which the metal content other than zinc is less than 0.1 wt.% and the volume resistivity is at most 1.0×10Ωcm at 25°C is manufactured, used as a sputtering target, and the transparency film is manufactured by a DC sputtering method. |
