<p>The present invention relates to a method for manufacturing an electrode pattern, including the steps of: providing a metal mesh structure layer; forming a first electrode layer including a metal seed in a fixed area of the metal mesh structure layer; and forming a metal plated layer in the fixed area of the first electrode layer including the metal seed. The method can realize nano-scale mesh line width, by these first electrode layers, by forming the first electrode layers including a plurality of metal seeds among a plurality of first metal lines or a plurality of second metal lines, using an electro spinning method.</p>
申请公布号
KR20150084491(A)
申请公布日期
2015.07.22
申请号
KR20140004577
申请日期
2014.01.14
申请人
KOREA INSTITUTE OF MACHINERY & MATERIALS
发明人
CHOI, SUNG MOOK;LEE, JOO YUL;CHANG, DO YON;CHA, SU SUB;LEE, KYU HWAN;KIM, MAN;JEONG, YONG SOO;YIM, SEONG BONG