发明名称 レジスト用重合体の製造方法、レジスト組成物の製造方法、およびパターンが形成された基板の製造方法
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for producing a polymer for electronic material, capable of efficiently reducing a residual monomer included in the polymer. <P>SOLUTION: The method for producing a polymer for electronic material includes the steps of: radically polymerizing a monomer by use of a polymerization initiator in the presence of a polymerizing solvent to obtain a polymerization reaction solution; and decompressing and concentrating the resulting polymerization reaction solution to remove the unreacted monomer. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP5751487(B2) 申请公布日期 2015.07.22
申请号 JP20110160005 申请日期 2011.07.21
申请人 三菱レイヨン株式会社 发明人 安田 敦;押切 友也
分类号 C08F6/10;G03F7/039;H01L21/027 主分类号 C08F6/10
代理机构 代理人
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