| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition, a method for forming a resist pattern, and a polymer compound.SOLUTION: A resist composition includes a base component (A) that generates an acid by exposure and changes solubility in a developing solution by an action of an acid. The base component (A) includes a resin component (A1) having any constitutional unit (a0-1) selected from formulae (a0-11) to (a0-13), a constitutional unit (a0-2) generating an acid by exposure, and a constitutional unit (a1) that is derived from an acylate and includes an acid-decomposable group whose polarity is increased by an action of an acid. In the formulae, R represents H, an alkyl group or a halogenated alkyl group; Xrepresents a single bond or a divalent connecting group; W, W, Weach represent a cyclic saturated hydrocarbon groups, however, Whas an OH group; Rrepresents an OH group-containing saturated hydrocarbon group; p represents 1 to 3; Xand Xeach represent a divalent connecting group; and Rand Reach represent H, an alkyl group, an OH group or an alkyl group having an OH group. |
