| 摘要 |
The invention provides a photosensitive resin composition for black resist, and a light shielding film for a color filter. The light shielding film for a color filter is composed of the photosensitive resin composition for black resist. The light shielding film for a color filter can form patterns with excellent pattern size stability, excellent imaging margins and great image edge shape even if the light shielding film is thick. Meanwhile, in the subsequent thermal sintering step, the coating surface is made smooth and the surface roughness will not deteriorate due to thermal hardening contraction. The photosensitive resin composition for black resist comprises the following components as necessary, namely, (A) a dendritic polymer with an end having more than two ethylene type polymer bases; (B) compounds having unsaturated bases and obtained by making epoxy compounds having two glycidoxyproyl and derived from double phenols, and (methyl) acrylic acid reactant, react with polybasic carboxylic acid or acid anhydrides thereof; (C) a photopolymerization initiator; and (D) more than one light shielding component selected from black organic fertilizers, color mixing organic pigments and light shielding materials. |
