PHASE SHIFT MASK,PATTERNING METHOD USING THE SAME AND METHOD FOR MANUFACTURING DISPLAY PANEL USING THE SAME

摘要

A phase shift mask comprises: a transparent substrate and a phase shift pattern formed on the transparent substrate and having part with a first thickness and a second thickness. The phase shift pattern has a first opening with a first width at the part with the first thickness and a second opening with a second width at the part with the second thickness. The manufacturing method for a pattern comprises: a step to form a photo resistant layer on the PCB including a first area and a second area that is higher than the first area by a second height; a step to expose the photo resistant layer by using the phase shift mask including the phase shift pattern having the first area with the first thickness and the second area with the second thickness thinner than the first thickness; a step to form the photo resistant pattern by developing the exposed photo resistant layer by using development liquid; a step to form a first pattern in the first area and a second pattern in the second area on the substrate by partially carving the substrate with the photo resistant pattern; and a step to remove the photo resistant pattern.