发明名称 Implantable SERS sensing device and method to fabricate
摘要 A method for manufacturing a SERS sensing device (100), the method comprising: providing a silicon substrate (101), creating a silane layer (102) on a surface of the silicon substrate (101), and creating a plurality of plasmonic nanostructures (103) on the silane layer (102), characterized in that: creating a plurality of plasmonic nanostructures (103) on the silane layer (102) comprises completely covering the silane layer (102) with a metallic plasmonic layer (104). Further a SERS sensing device is presented which is implantable.
申请公布号 EP2896956(A1) 申请公布日期 2015.07.22
申请号 EP20150151213 申请日期 2015.01.15
申请人 IMEC VZW;PANASONIC CORPORATION;KATHOLIEKE UNIVERSITEIT LEUVEN 发明人 OKUMURA, YASUAKI;JANS, HILDE;LI, JIAQI;MINAMIGUCHI, MASARU;LAGAE, LIESBET
分类号 G01N21/552;G01N21/65 主分类号 G01N21/552
代理机构 代理人
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