发明名称 |
Implantable SERS sensing device and method to fabricate |
摘要 |
A method for manufacturing a SERS sensing device (100), the method comprising: providing a silicon substrate (101), creating a silane layer (102) on a surface of the silicon substrate (101), and creating a plurality of plasmonic nanostructures (103) on the silane layer (102), characterized in that: creating a plurality of plasmonic nanostructures (103) on the silane layer (102) comprises completely covering the silane layer (102) with a metallic plasmonic layer (104). Further a SERS sensing device is presented which is implantable. |
申请公布号 |
EP2896956(A1) |
申请公布日期 |
2015.07.22 |
申请号 |
EP20150151213 |
申请日期 |
2015.01.15 |
申请人 |
IMEC VZW;PANASONIC CORPORATION;KATHOLIEKE UNIVERSITEIT LEUVEN |
发明人 |
OKUMURA, YASUAKI;JANS, HILDE;LI, JIAQI;MINAMIGUCHI, MASARU;LAGAE, LIESBET |
分类号 |
G01N21/552;G01N21/65 |
主分类号 |
G01N21/552 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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