| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad for giving scratchless polishing surface of an object to be polished.SOLUTION: The polishing pad 10 has a urethane sheet 2 formed by a wet-coagulation process. The urethane sheet 2 has protrusions 5, and recesses 6 between the protrusions 5, on one side surface. Surfaces of the protrusions 5 constitute a polishing surface P. In the protrusion 5, a plurality of foams 3 with the maximum diameter acquired by cross-section observation in a range of 50-300 μm are formed and a large number of fine holes 4 with the maximum diameter in a range of 1 to 10 μm are formed between the foams 3. Open holes 3a, 4a are formed on the polishing surface P. Open holes 3a are crushed when forming the recesses 6 by thermal emboss process and open holes 4a are contracted in their diameters or closed at a surface of the recesses 6. Retention of polishing liquid or polishing sludge is suppressed in the recesses 6, and the polishing liquid is circulation-supplied and the polishing sludge is exhausted through the recesses 6. |
