发明名称 |
Instalação e processo para a redução do teor de elementos, tais como boro, em halogenossilanos. |
摘要 |
<p>The invention relates to a method for reducing the content in elements of the third main group of the periodic system, especially in boron- and aluminum-containing compounds of technically pure halosilanes for producing high-purity halosilanes, especially high-purity chlorosilanes. The invention further relates to an installation for carrying out said method.</p> |
申请公布号 |
BRPI0822003(A2) |
申请公布日期 |
2015.07.21 |
申请号 |
BR2008PI22003 |
申请日期 |
2008.11.20 |
申请人 |
EVONIK DEGUSSA GMBH |
发明人 |
EKKEHARD MÜH;HARTWIG RAULEDER;REINHOLD SCHORK |
分类号 |
C01B33/107;C01B33/08 |
主分类号 |
C01B33/107 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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