Resist protective film-forming composition and patterning process

摘要

A protective film-forming composition comprising a polymer comprising fluorinated alcohol units of the structure: —C(CF3)2OR1 wherein R1 is H or a monovalent hydrocarbon group and having a Mw of 1,000-500,000 is applied onto a resist film to form a protective film thereon. The protective film-forming composition has high water repellent and water slip performance. The protective film exhibits barrier properties to water and prevents any resist components from being leached out in water.

主权项

1. A resist protective film-forming composition comprising a polymer comprising recurring units of the general formula (1) and having a weight average molecular weight of 1,000 to 500,000,wherein R1 is hydrogen or a straight, branched or cyclic C1-C20 monovalent hydrocarbon group in which a constituent moiety —CH2— may be replaced by —O— or —C(═O)—, R2 is hydrogen, fluorine, methyl or trifluoromethyl, Aa is a straight, branched or cyclic C1-C20 hydrocarbon or fluorinated hydrocarbon group having a valence of k1+1, Ab is a straight, branched or cyclic C1-C6 divalent hydrocarbon group, k1 is an integer of 1 to 3, and k2 is 1.