发明名称 |
Resistive memory arrangement and a method of forming the same |
摘要 |
According to embodiments of the present invention, a resistive memory arrangement is provided. The resistive memory arrangement includes a nanowire, and a resistive memory cell including a resistive layer including a resistive changing material, wherein at least a section of the resistive layer is arranged covering at least a portion of a surface of the nanowire, and a conductive layer arranged on at least a part of the resistive layer. According to further embodiments of the present invention, a method of forming a resistive memory arrangement is also provided. |
申请公布号 |
US9087975(B2) |
申请公布日期 |
2015.07.21 |
申请号 |
US201313745993 |
申请日期 |
2013.01.21 |
申请人 |
Agency for Science, Technology and Research |
发明人 |
Wang Xinpeng;Li Xiang;Singh Navab;Lo Guo-Qiang Patrick |
分类号 |
H01L45/00;H01L27/24;B82Y10/00;B82Y40/00 |
主分类号 |
H01L45/00 |
代理机构 |
Crockett & Crockett, PC |
代理人 |
Crockett, Esq. K. David;Syrengelas, Esq. Niky Economy;Crockett & Crockett, PC |
主权项 |
1. A resistive memory arrangement comprising:
a nanowire having a longitudinal axis; and a resistive memory cell comprising: a resistive layer comprising a resistive changing material, wherein at least a section of the resistive layer is arranged covering at least a portion of a surface of the nanowire, and wherein at least a portion of the resistive layer is arranged around the longitudinal axis and at least substantially surrounding the nanowire; and a conductive layer arranged on at least a part of the resistive layer, wherein at least a portion of the conductive layer is arranged at least substantially surrounding the portion of the resistive layer; wherein the nanowire and the conductive layer act as separate electrical contacts to allow a current flow between the nanowire and the conductive layer through the resistive layer. |
地址 |
Singapore SG |