发明名称 Resistive memory arrangement and a method of forming the same
摘要 According to embodiments of the present invention, a resistive memory arrangement is provided. The resistive memory arrangement includes a nanowire, and a resistive memory cell including a resistive layer including a resistive changing material, wherein at least a section of the resistive layer is arranged covering at least a portion of a surface of the nanowire, and a conductive layer arranged on at least a part of the resistive layer. According to further embodiments of the present invention, a method of forming a resistive memory arrangement is also provided.
申请公布号 US9087975(B2) 申请公布日期 2015.07.21
申请号 US201313745993 申请日期 2013.01.21
申请人 Agency for Science, Technology and Research 发明人 Wang Xinpeng;Li Xiang;Singh Navab;Lo Guo-Qiang Patrick
分类号 H01L45/00;H01L27/24;B82Y10/00;B82Y40/00 主分类号 H01L45/00
代理机构 Crockett & Crockett, PC 代理人 Crockett, Esq. K. David;Syrengelas, Esq. Niky Economy;Crockett & Crockett, PC
主权项 1. A resistive memory arrangement comprising: a nanowire having a longitudinal axis; and a resistive memory cell comprising: a resistive layer comprising a resistive changing material, wherein at least a section of the resistive layer is arranged covering at least a portion of a surface of the nanowire, and wherein at least a portion of the resistive layer is arranged around the longitudinal axis and at least substantially surrounding the nanowire; and a conductive layer arranged on at least a part of the resistive layer, wherein at least a portion of the conductive layer is arranged at least substantially surrounding the portion of the resistive layer; wherein the nanowire and the conductive layer act as separate electrical contacts to allow a current flow between the nanowire and the conductive layer through the resistive layer.
地址 Singapore SG