发明名称 |
Production method and evaluation apparatus for mask layout |
摘要 |
According to one embodiment, a production method for a mask layout of an exposure mask includes evaluating a candidate layout by comparison between an imaged image group and a reference image group. The imaged image group is composed of a plurality of imaged images of patterns formed by performing lithography under a plurality of levels of exposure condition using the candidate layout. The reference image group is composed of a plurality of reference images produced by simulation on assumption of a plurality of levels of the exposure condition. |
申请公布号 |
US9086634(B2) |
申请公布日期 |
2015.07.21 |
申请号 |
US201314013213 |
申请日期 |
2013.08.29 |
申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
Kono Yuko;Masukawa Kazuyuki;Kotani Toshiya;Kodama Chikaaki;Kai Yasunobu |
分类号 |
G03F1/70;G03F1/68 |
主分类号 |
G03F1/70 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A production method for a mask layout of an exposure mask, comprising:
evaluating a candidate layout by comparison between an imaged image group and a reference image group, the imaged image group being composed of a plurality of imaged images of patterns formed by performing lithography under a plurality of levels of exposure condition using the candidate layout, and the reference image group being composed of a plurality of reference images produced by simulation on assumption of a plurality of levels of the exposure condition. |
地址 |
Minatu-ku JP |