| 摘要 |
Provided is a method of forming a pattern, including forming an actinic-ray- or radiation-sensitive resin composition into a film, the actinic-ray- or radiation-sensitive resin composition including a resin (A) including a repeating unit containing a group that when acted on by an acid, is decomposed to thereby produce a polar group and including an aromatic group, which resin when acted on by an acid, decreases its solubility in an organic solvent, a nonionic compound (B) that when exposed to actinic rays or radiation, generates an acid and a solvent (C), exposing the film to actinic rays or radiation, and developing the exposed film with a developer including an organic solvent to thereby form a negative pattern. |
| 主权项 |
1. A method of forming a pattern, comprising;
forming an actinic-ray- or radiation-sensitive resin composition into a film, the actinic-ray- or radiation-sensitive resin composition comprising;
a resin (A) comprising a repeating unit containing a group that when acted on by an acid, is decomposed to thereby produce a polar group and comprising an aromatic group, which resin when acted on by an acid, decreases its solubility in an organic solvent,a nonionic compound (B) that when exposed to actinic rays or radiation, generates an acid, anda solvent (C); exposing the film to a KrF light; and developing the exposed film with a developer comprising an organic solvent to thereby form a negative pattern, wherein the nonionic compound (B) is expressed by general formula (B1) or (B2) below, in general formula (B1),R represents an organic group, andA represents an alkylene group, a cycloalkylene group, an alkenylene group, a cycloalkenylene group or an arylene group; andin general formula (B2),R represents an organic group, andeach of X and Y independently represents an alkyl group, a cycloalkyl group, an aryl group, a cyano group or a nitro group, provided that X and Y may be bonded to each other to thereby form a ring,provided that X or Y of any of compounds of general formula (B2) may be bonded to X or Y of any of other compounds of general formula (B2) via a connecting group or a single bond. |
