发明名称 |
Treatment of a self-assembled monolayer on a dielectric layer for improved epoxy adhesion |
摘要 |
This disclosure provides systems, methods, and apparatus for treating a self-assembled monolayer coating on a dielectric layer to improve epoxy adhesion to the self-assembled monolayer coating. In implementations of the methods, a dielectric layer on a surface of a substrate is provided. A self-assembled monolayer coating is formed on the dielectric layer. A seal region of the self-assembled monolayer coating is selectively treated. A component is bonded to the seal region of the self-assembled monolayer coating with an epoxy. Implementations of the methods may be used to encapsulate an electromechanical systems device on the substrate with a cover using an epoxy. |
申请公布号 |
US9085457(B2) |
申请公布日期 |
2015.07.21 |
申请号 |
US201113046558 |
申请日期 |
2011.03.11 |
申请人 |
Qualcomm MEMS Technologies, Inc. |
发明人 |
Heald David Leslie;Rafanan Majorio Arafiles |
分类号 |
G09G3/34;B81C1/00 |
主分类号 |
G09G3/34 |
代理机构 |
Weaver Austin Villeneuve & Sampson LLP |
代理人 |
Weaver Austin Villeneuve & Sampson LLP |
主权项 |
1. A method comprising:
providing a dielectric layer on a surface of a substrate, over an electromechanical systems device disposed on the substrate; forming a self-assembled monolayer on the dielectric layer; selectively treating a seal region of the self-assembled monolayer; and bonding a component to the seal region of the self-assembled monolayer with an epoxy. |
地址 |
San Diego CA US |