发明名称 Treatment of a self-assembled monolayer on a dielectric layer for improved epoxy adhesion
摘要 This disclosure provides systems, methods, and apparatus for treating a self-assembled monolayer coating on a dielectric layer to improve epoxy adhesion to the self-assembled monolayer coating. In implementations of the methods, a dielectric layer on a surface of a substrate is provided. A self-assembled monolayer coating is formed on the dielectric layer. A seal region of the self-assembled monolayer coating is selectively treated. A component is bonded to the seal region of the self-assembled monolayer coating with an epoxy. Implementations of the methods may be used to encapsulate an electromechanical systems device on the substrate with a cover using an epoxy.
申请公布号 US9085457(B2) 申请公布日期 2015.07.21
申请号 US201113046558 申请日期 2011.03.11
申请人 Qualcomm MEMS Technologies, Inc. 发明人 Heald David Leslie;Rafanan Majorio Arafiles
分类号 G09G3/34;B81C1/00 主分类号 G09G3/34
代理机构 Weaver Austin Villeneuve & Sampson LLP 代理人 Weaver Austin Villeneuve & Sampson LLP
主权项 1. A method comprising: providing a dielectric layer on a surface of a substrate, over an electromechanical systems device disposed on the substrate; forming a self-assembled monolayer on the dielectric layer; selectively treating a seal region of the self-assembled monolayer; and bonding a component to the seal region of the self-assembled monolayer with an epoxy.
地址 San Diego CA US
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