发明名称 Enhancement-mode III-nitride devices
摘要 A III-N enhancement-mode transistor includes a III-N structure including a conductive channel, source and drain contacts, and a gate electrode between the source and drain contacts. An insulator layer is over the III-N structure, with a recess formed through the insulator layer in a gate region of the transistor, with the gate electrode at least partially in the recess. The transistor further includes a field plate having a portion between the gate electrode and the drain contact, the field plate being electrically connected to the source contact. The gate electrode includes an extending portion that is outside the recess and extends towards the drain contact. The separation between the conductive channel and the extending portion of the gate electrode is greater than the separation between the conductive channel and the portion of the field plate that is between the gate electrode and the drain contact.
申请公布号 US9087718(B2) 申请公布日期 2015.07.21
申请号 US201313799989 申请日期 2013.03.13
申请人 Transphorm Inc. 发明人 Lal Rakesh K.
分类号 H01L29/66;H01L27/088;H01L29/78;H01L21/8252;H01L27/06;H01L27/085;H01L29/423 主分类号 H01L29/66
代理机构 Fish & Richardson P.C. 代理人 Fish & Richardson P.C.
主权项 1. An enhancement-mode transistor, comprising: a semiconductor material structure including a conductive channel therein; a source contact and a drain contact, the source and drain contacts electrically contacting the conductive channel; a gate electrode positioned between the source and drain contacts; an additional contact between the gate electrode and the drain contact; a field plate that is electrically connected to the source contact; and a diode; wherein a first side of the diode is electrically connected to the field plate, and a second side of the diode is electrically connected to the additional contact.
地址 Goleta CA US