发明名称 GROWTH OF HIGH-QUALITY SINGLE LAYER GRAPHENE USING CU/NI MULTI-CATALYST AND GRAPHENE DEVICE USING THE METHOD
摘要 The present invention relates to a method for growing high-quality single layer graphene using a Cu/Ni multi-layered metal catalyst, and to a graphene device using the same. According to the method, when graphene is grown in a CVD method, the Cu/Ni multi-layered metal catalyst, which has a fixed thickness of a lower nickel layer and a varied thickness of an upper copper layer, is used to grow the high-quality single layer graphene under the control. According to the method, the high-quality single layer graphene can be obtained; performance of a graphene application device is increased by using the same graphene; and the graphene can significantly contribute to industrialization.
申请公布号 KR20150083484(A) 申请公布日期 2015.07.20
申请号 KR20140002973 申请日期 2014.01.09
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 CHOI, JIN SIK;CHOI, HONG KYW;KIM, KI CHUL;YU, YOUNG JUN;KIM, JIN SOO;CHOI, CHOON GI
分类号 C01B31/02 主分类号 C01B31/02
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