发明名称 |
GROWTH OF HIGH-QUALITY SINGLE LAYER GRAPHENE USING CU/NI MULTI-CATALYST AND GRAPHENE DEVICE USING THE METHOD |
摘要 |
The present invention relates to a method for growing high-quality single layer graphene using a Cu/Ni multi-layered metal catalyst, and to a graphene device using the same. According to the method, when graphene is grown in a CVD method, the Cu/Ni multi-layered metal catalyst, which has a fixed thickness of a lower nickel layer and a varied thickness of an upper copper layer, is used to grow the high-quality single layer graphene under the control. According to the method, the high-quality single layer graphene can be obtained; performance of a graphene application device is increased by using the same graphene; and the graphene can significantly contribute to industrialization. |
申请公布号 |
KR20150083484(A) |
申请公布日期 |
2015.07.20 |
申请号 |
KR20140002973 |
申请日期 |
2014.01.09 |
申请人 |
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
发明人 |
CHOI, JIN SIK;CHOI, HONG KYW;KIM, KI CHUL;YU, YOUNG JUN;KIM, JIN SOO;CHOI, CHOON GI |
分类号 |
C01B31/02 |
主分类号 |
C01B31/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|