EXPOSURE APPARATUS AND EXPOSURE METHOD USING THE SAME

摘要

The present invention relates to an exposure method comprising the steps of: loading a first substrate to a loading unit; moving the first substrate in a first direction to expose the first substrate to light; loading a second substrate to the loading unit while moving the first substrate in the first direction to expose the first substrate to light; moving the second substrate in the first direction to expose the second substrate to light while moving the first substrate in the first direction to expose the first substrate to light; and moving the second substrate in the first direction to expose the second substrate to light while unloading the first substrate from an unloading unit. An exposure apparatus for the exposure method comprises: an exposure unit having a light source for generating light; a stage including the loading unit, a working unit and the unloading unit; a first gripper arranged adjacent to a first side of the stage in a second direction vertical to the first direction and capable of moving the substrates in the first direction; and a second gripper arranged adjacent to a second side of the stage opposite to the first side in the second direction and capable of moving the substrates in the first direction.