发明名称 SUBSTRATE AND MANUFACTURING METHOD THEREOF
摘要 <p>Disclosed are a substrate and a manufacturing method thereof. According to an embodiment of the present invention, the substrate comprises: an insulating layer which comprises a via hole; a first conductive layer which is laminated on the insulating layer and is formed with an inclination while a vertex in a lower side adjacent to the via hole and an edge in a lower side connecting the vertex are retracting in the receding direction from the via hole based on a vertical section; and a second conductive layer which fills the via hole and is laminated on the first conductive layer.</p>
申请公布号 KR20150083685(A) 申请公布日期 2015.07.20
申请号 KR20140003536 申请日期 2014.01.10
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 CHOI, KYE WON;JUNG, JOONG HYUK;JOUNG, DA HEE
分类号 H05K3/40;H05K1/02 主分类号 H05K3/40
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