发明名称 EVAPORATION SOURCE FOR DEPOSITION APPARATUS
摘要 <p>The present invention relates to an evaporation source for a deposition apparatus. The evaporation source of the present invention comprises a crucible storing an evaporation material inside; a heater part installed to surround the crucible, and applying heat; a reflective plate installed to surround the heater part; a cooling jacket installed to surround the crucible, and having a cooling fluid flow inside; and a cover plate covering the upper end of the cooling jacket, wherein the cover plate is separated from the upper end of the crucible.</p>
申请公布号 KR20150083716(A) 申请公布日期 2015.07.20
申请号 KR20140003586 申请日期 2014.01.10
申请人 SUNIC SYSTEM. LTD. 发明人 SUNG, GI HYUN;RYU, KYUN KYOUNG;PARK, YEONG SHIN;KANG, SOON SEOG;LEE, YOUNG JONG
分类号 C23C14/24;H01L51/56 主分类号 C23C14/24
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