PHOTORESIST COMPOSITION FOR LIGHT SHIELDING AND LIGHT SHIELDING LAYER OBTAINED THEREFROM

摘要

The present invention relates to a light shielding photosensitive resin composition and a light shielding layer prepared therewith. The light shielding photosensitive resin composition comprises: (A) siloxane resin, (B) pigment, (C) photo-polymerization initiator, and (D) organic solvent, and selectively further comprises: (E) multifunctional monomer with unsaturated bonding. A film for a light shielding layer prepared with the light shielding photosensitive resin composition exhibits superior electrical properties, strong bonding strength with a substrate, and no reduction in optical density, even after a high temperature process of about 300°C or higher.