发明名称 PRESSURE REGULATOR AND POLISHING APPARATUS HAVING THE PRESSURE REGULATOR
摘要 Provided is a pressure control device capable of improving the duplex of stability of pressure and responsibility for an input signal. APID control unit (5) stops the production of a correction command value from time point t1 in which a pressure command value is changed to a PID control starting point t3 and produces the correction command value after the PID control starting point t3. A regulator control unit (8) controls the operation of a pressure control valve (6) to remove the difference between the pressure command value and the first pressure value from time point t1 when the pressure command value is changed to the PID control starting point t3. The regulator control unit (8) controls the operation of the pressure control valve (6) to remove any difference between the correction command value and the first pressure value after the PID control starting point t3.
申请公布号 KR20150083432(A) 申请公布日期 2015.07.17
申请号 KR20150001846 申请日期 2015.01.07
申请人 EBARA CORPORATION 发明人 TAKAHASHI NOBUYUKI;MARUYAMA TORU;SAKUGAWA SUGURU
分类号 H01L21/304 主分类号 H01L21/304
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