发明名称 SUBSTRATE CASE CLEANING APPARATUS
摘要 Contaminant which sticks to an outer pod which is exposed to the outside air is prevented from contaminating an inner pod and the two can be cleaned so the cleaning precision can be improved. A substrate case C which is provided with an inner pod N which holds a substrate at the inside and an outer pod M which holds the inner pod N at the inside is cleaned in a state with no substrate. A booth 10 which forms a clean space is provided. Inside the booth 1, a first cleaning tank 40 which cleans the parts of the outer base Mb and outer shell Ms of the outer pod M in a separated state and a second cleaning tank 50 which holds and cleans the parts of the inner base Nb and inner shell Ns of the inner pod N in a separated state are provided. A conveyance mechanism is provided with conveys these parts to the corresponding first cleaning tank 40 and second cleaning tank 50.
申请公布号 US2015196938(A1) 申请公布日期 2015.07.16
申请号 US201314420035 申请日期 2013.09.13
申请人 HUGLE ELECTRONICS INC. 发明人 Sakashita Toshiya
分类号 B08B3/08 主分类号 B08B3/08
代理机构 代理人
主权项 1. A substrate case cleaning apparatus which cleans, in a state with no substrate, a substrate case which is provided with an inner pod which is comprised of an inner base and an inner shell which covers said inner base and holds a substrate inside it and with an outer pod which is comprised of an outer base which supports said inner base of said inner pod and an outer shell which covers said outer base and holds said inner pod inside it, said substrate case cleaning apparatus comprising: a booth which forms a clean space, a first cleaning tank which is provided inside said booth and holds and cleans parts of the outer base and outer shell of said outer pod in a separated state, a second cleaning tank which is provided inside said booth and holds and cleans parts of the inner base and inner shell of said inner pod in a separated state, and a conveyance mechanism which conveys the parts of said outer pod and said inner pod to the corresponding first cleaning tank and second cleaning tank.
地址 Chiyoda-ku, Tokyo JP