| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint method which allows for stable high definition imprint transfer, and to provide a substrate for imprint which allows for such imprint method.SOLUTION: A substrate 11 for imprint includes a substrate body 12, and an enclosure 13 located on one surface of the substrate body 12, on the inside of a region where an uneven structure is formed by imprint transfer. The enclosure 13 surrounds a droplet of resin and prevents the resin from spreading. The height of a droplet of resin 51 supplied, as a workpiece, onto the substrate 11 for imprint can be maintained, and the resin spreads on the entire surface of a mold 61, when the pattern region of the mold is pressed. |
