| 发明名称 |
NANO-SCALE CHARACTERISTIC FORM GENERATION METHOD USING SOFT LITHOGRAPHY |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a method which generates a molecular film using soft lithography.SOLUTION: A nano-scale characteristic form generation method includes the steps of: generating a pattern having at least one nano-scale characteristic form in a formability polymer composition; and disposing at least one portion of the pattern in an area near a first substrate. |
| 申请公布号 |
JP2015130497(A) |
申请公布日期 |
2015.07.16 |
| 申请号 |
JP20140258181 |
申请日期 |
2014.12.22 |
| 申请人 |
DOW CORNING CORP |
发明人 |
SIM AHN;JOHN ROGERS;HUA FENG;FA KEQING;PAUL BOHN |
| 分类号 |
H01L21/027;B29C39/02;B82B3/00;B82Y10/00;B82Y30/00;B82Y40/00 |
主分类号 |
H01L21/027 |
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