| 摘要 |
PROBLEM TO BE SOLVED: To provide an overcoat composition that can solve a problem of an additive-type quencher in negative type development, and a method for forming an electronic device.SOLUTION: The method for forming an electronic device includes the following steps in sequence: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) forming a photoresist layer over the one or more layers to be patterned, the photoresist layer formed from a composition that comprises a matrix polymer comprising a unit having an acid labile group, a photoacid generator, and an organic solvent; (c) coating the photoresist layer with a photoresist overcoat composition that comprises a quenching polymer and an organic solvent, the quenching polymer comprising a unit having a basic portion effective to neutralize an acid generated by the photoacid generator in a surface region of the photoresist layer; (d) exposing the photoresist layer to activation radiation; (e) heating the substrate in a post-exposure bake process; and (f) developing the exposed film with an organic solvent developer. |
