| 摘要 |
本发明揭露一种镀膜装置，其包含真空镀膜室、基板承载机构、复数组镀膜源系统及复数组镀膜修正板系统，镀膜修正板系统之数目与镀膜源系统相同。真空镀膜室包含底部、顶部及环绕底部及顶部之周围面。基板承载机构系设置于顶部，复数组镀膜源系统系设置于底部，镀膜修正板系统系设置于周围面。任一镀膜源系统系与单一且唯一之镀膜修正板系统配合以进行镀膜。每一镀膜修正板系统设置之最佳位置为正对于对应镀膜源系统之周围面之左右两侧10°之内的区域。 Disclosed in the present invention is a coating apparatus, including a vacuum coating room, a substrate support mechanism, a plurality of coating source systems, and a plurality of coating mask systems. The number of the coating mask systems is equal to that of the coating source systems. The vacuum coating room includes a bottom, a top, and a surrounding surface. The substrate support mechanism is installed on the top, the plurality of coating source systems are installed on the bottom, and the plurality of coating mask systems are installed on the surrounding surface. Any one of the coating source systems is accompanied with one and only one coating mask system to perform coating. The best position to install each coating mask system is within the right and left 10° |
