Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same

摘要

Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, R01 represents a hydrogen atom or a monovalent organic group, and M+ represents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER.;

主权项

1. A fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3), wherein each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, n represents an integer of 1-10, W represents a bivalent linking group, R01 represents a hydrogen atom or a monovalent organic group, and M+ represents a monovalent cation.