| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method, by which radiation irregularity by a slit and spin system can be reduced in the process of forming a black resist and a color resist by application and development so as to form, on a transparent substrate, a plurality of color pixels comprising a plurality of colors and a black matrix for blocking leaked light through a boundary or the like where the pixels are adjoining to each other.SOLUTION: The method for manufacturing a color filter comprises: two-dimensionally arranging a plurality of color pixels 2 comprising a plurality of colors on a transparent substrate 1; and disposing a pixel black matrix 3 on a boundary part where the pixels are adjoining to each other, and disposing a frame black matrix 4 on a frame part of the color filter. The frame black matrix 4 is disposed after the pixel black matrix 3 and the color pixels 2 comprising a plurality of colors are formed. |
