| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and method for inspecting interference fringe and color unevenness of an article with a surface having a minute uneven structure formed at pitch equal to or less than a wavelength of visible light, and to provide a method of manufacturing an article with a surface having a minute uneven structure with reduced interference fringe and color unevenness.SOLUTION: An inspection apparatus includes: irradiation means 20 (first irradiation means and second irradiation means) for irradiating an article 100 with light; imaging means 10 which images light emitted from the irradiation means 20 and reflected by the article 100; and image processing means 30 which determines states of interference fringe and color unevenness of an article with a surface having a minute uneven structure formed at a pitch equal to or less than a wavelength of visible light, on the basis of a luminance signal from the imaging means 10. |
