发明名称 RECESSED CONTACT TO SEMICONDUCTOR NANOWIRES
摘要 A semiconductor nanowire device includes at least one semiconductor nanowire having a bottom surface and a top surface, an insulating material which surrounds the semiconductor nanowire, and an electrode ohmically contacting the top surface of the semiconductor nanowire. A contact of the electrode to the semiconductor material of the semiconductor nanowire is dominated by the contact to the top surface of the semiconductor nanowire.
申请公布号 US2015200262(A1) 申请公布日期 2015.07.16
申请号 US201514671666 申请日期 2015.03.27
申请人 SOL VOLTAICS AB 发明人 Åberg Ingvar;Magnusson Martin;Asoli Damir;Samuelson Lars Ivar;Ohlsson Jonas
分类号 H01L29/41;H01L21/02;H01L33/42;H01L33/02;H01L31/0224;H01L29/06;H01L31/042 主分类号 H01L29/41
代理机构 代理人
主权项 1. A method of making a semiconductor nanowire device, comprising: forming at least one semiconductor nanowire, the semiconductor nanowire having a catalyst particle on a top surface of the semiconductor nanowire or a sacrificial portion comprising the top surface; forming an insulating material around the semiconductor nanowire; removing the catalyst particle or the sacrificial portion to recess the top surface of the nanowire below a top surface of the insulating material; and forming an electrode in ohmic contact with the top surface of the nanowire.
地址 LUND SE