COMPOSITION AND METHOD FOR POLISHING MEMORY HARD DISKS

摘要

The invention provides a chemical-mechanical polishing composition containing aluminate-modified silica particles, a polyacrylamide, a heterocyclic film-forming agent, and water. The invention also provides a method of chemically-mechanically polishing a substrate, especially a nickel-phosphorous substrate, by contacting a substrate with a polishing pad and the chemical-mechanical polishing composition, moving the polishing pad and the polishing composition relative to the substrate, and abrading at least a portion of the substrate to polish the substrate.

主权项

1. A chemical-mechanical polishing composition comprising:
(a) about 0.001 wt. % to about 10 wt. % of aluminate-modified silica particles, (b) about 1 ppm to about 1000 ppm of a polyacrylamide, (c) optionally, a heterocyclic film-forming agent, and (d) water,wherein the polishing composition has a pH of about 1 to about 7.