发明名称 DISPLAY DEVICE MAKING METHOD AND LIGHT EMITTING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method that simplifies a peeling process and uniformly performs peeling and transcription to a large substrate.SOLUTION: When a metal film is formed on a first substrate and then an insulating film containing silicon is formed in contact with the metal film, an oxide metal film is formed on a surface of the metal film. A semiconductor element such as a thin film transistor is formed on the insulating film. When a second substrate is fixed on the semiconductor element using a first adhesive and the first substrate is separated, and a third substrate such as a film substrate is fixed under the semiconductor element using a second adhesive and the second substrate is separated, lowering of adhesiveness or peeling of the first adhesive and hardening of the second adhesive are simultaneously performed by irradiation of ultraviolet light.
申请公布号 JP2015129942(A) 申请公布日期 2015.07.16
申请号 JP20150002574 申请日期 2015.01.08
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI;TAKAYAMA TORU;MARUYAMA JUNYA;GOTO YUGO;FUKUMOTO YUMIKO
分类号 G09F9/00;G02F1/13;G02F1/136;G02F1/1368;G09F9/30;H01L21/02;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L27/32;H01L29/786;H01L51/50;H05B33/10;H05B33/14;H05B33/22 主分类号 G09F9/00
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