发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To inhibit fluctuation in electric characteristics in a semiconductor device using a transistor which has an oxide semiconductor and improve reliability.SOLUTION: A semiconductor device comprises: a gate electrode on an insulating surface; an oxide semiconductor film which overlaps the gate electrode; a gate insulation film between the gate electrode and the oxide semiconductor film, which contacts the oxide semiconductor film; a protection film on the oxide semiconductor film on a surface on the side opposite to a surface which contacts the gate insulation film; and a pair of electrodes which contact the oxide semiconductor film. In the gate insulation film or the protection film, an emission amount of a gas at a mass-to-charge ratio m/z=17 emitted by a heat treatment is larger than an emission amount of a nitrogen oxide emitted by a heat treatment.</p> |
申请公布号 |
JP2015130482(A) |
申请公布日期 |
2015.07.16 |
申请号 |
JP20140206419 |
申请日期 |
2014.10.07 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
YAMAZAKI SHUNPEI;HOSAKA HIROYASU;UBUNAI TOSHIMITSU;HIZUKA JUNICHI;SHIMA YUKINORI;HAYAKAWA MASAHIKO;HAMOCHI TAKASHI;HIRAISHI SUZUNOSUKE |
分类号 |
H01L21/336;G02F1/1368;H01L21/28;H01L21/283;H01L29/786 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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