发明名称 |
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND |
摘要 |
A polymeric compound including a structural unit (a0) represented by general formula (a0-1) shown below and a polycyclic group-containing structural unit (a2m) other than the structural unit (a0), the structural unit (a2m) containing a lactone-containing polycyclic group, a —SO2-containing polycyclic group or a carbonate-containing polycyclic group, and a resist composition including the same:;;wherein R0 represents a hydrocarbon group of 1 to 6 carbon atoms which may have a substituent, or a hydrogen atom; Ya0 represents a single bond or a divalent linking group; L represents an ester bond; and Ra0 represents a polycyclic group having a bridged ring polycyclic skeleton or a condensed ring polycyclic skeleton, which has in its skeleton —C(═O)O— or —SO2—, and at least one of an alkyl group, an alkoxy group, a halogen atom and a halogenated alkyl group. |
申请公布号 |
US2015198880(A1) |
申请公布日期 |
2015.07.16 |
申请号 |
US201514596532 |
申请日期 |
2015.01.14 |
申请人 |
Tokyo Ohka Kogyo Co., Ltd. |
发明人 |
Shinomiya Miki;Hirano Tomoyuki;Endo Kotaro;Iwasawa Yuta |
分类号 |
G03F7/038;C08F228/06;C08F224/00;G03F7/30 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
1. A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, comprising:
a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) comprising a polymeric compound (A1) comprised of a structural unit (a0) represented by general formula (a0-1) shown below and a polycyclic group-containing structural unit (a2m) other than the structural unit (a0), the structural unit (a2m) containing a lactone-containing polycyclic group, a —SO2-containing polycyclic group or a carbonate-containing polycyclic group:wherein R0 represents a hydrocarbon group of 1 to 6 carbon atoms which may have a substituent, or a hydrogen atom; Ya0 represents a single bond or a divalent linking group; L represents an ester bond; and Ra0 represents a polycyclic group having a bridged ring polycyclic skeleton or a condensed ring polycyclic skeleton, which has in its skeleton —C(═O)O— or —SO2—, and at least one substituent selected from the group consisting of an alkyl group, an alkoxy group, a halogen atom and a halogenated alkyl group. |
地址 |
Kawasaki-shi JP |