发明名称 |
TUNNELING FIELD EFFECT TRANSISTOR |
摘要 |
The inventive concepts provide tunneling field effect transistors. The tunneling field effect transistor includes a source region, a drain region, a channel region, and a pocket region. The channel region includes a first material, and is disposed between the source region and the drain region. The pocket region includes a second material, and is disposed between the source region and the drain region. The channel region includes a first region adjacent to the source region, and a second region adjacent to the drain region. A first energy band gap of the first region is smaller than a second energy band gap of the second region, and a third energy band gap of the pocket region is different from the first energy band gap and the second energy band gap. |
申请公布号 |
US2015200289(A1) |
申请公布日期 |
2015.07.16 |
申请号 |
US201414570331 |
申请日期 |
2014.12.15 |
申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
ZHANG Xin-Gui;KWON Tae-Yong;YANG Jung-Gil;KIM Sang-Su |
分类号 |
H01L29/78;H01L29/205;H01L29/165 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
1. A tunneling field effect transistor comprising:
a source region and a drain region; a channel region including a first material, and disposed between the source region and the drain region; and a pocket region including a second material different from the first material, and disposed between the source region and the drain region, wherein the channel region comprises a first region adjacent to the source region, and a second region adjacent to the drain region, wherein a first energy band gap of the first region is smaller than a second energy band gap of the second region, and wherein a third energy band gap of the pocket region is different from the first energy band gap and the second energy band gap. |
地址 |
Suwon-si KR |