发明名称 TUNNELING FIELD EFFECT TRANSISTOR
摘要 The inventive concepts provide tunneling field effect transistors. The tunneling field effect transistor includes a source region, a drain region, a channel region, and a pocket region. The channel region includes a first material, and is disposed between the source region and the drain region. The pocket region includes a second material, and is disposed between the source region and the drain region. The channel region includes a first region adjacent to the source region, and a second region adjacent to the drain region. A first energy band gap of the first region is smaller than a second energy band gap of the second region, and a third energy band gap of the pocket region is different from the first energy band gap and the second energy band gap.
申请公布号 US2015200289(A1) 申请公布日期 2015.07.16
申请号 US201414570331 申请日期 2014.12.15
申请人 Samsung Electronics Co., Ltd. 发明人 ZHANG Xin-Gui;KWON Tae-Yong;YANG Jung-Gil;KIM Sang-Su
分类号 H01L29/78;H01L29/205;H01L29/165 主分类号 H01L29/78
代理机构 代理人
主权项 1. A tunneling field effect transistor comprising: a source region and a drain region; a channel region including a first material, and disposed between the source region and the drain region; and a pocket region including a second material different from the first material, and disposed between the source region and the drain region, wherein the channel region comprises a first region adjacent to the source region, and a second region adjacent to the drain region, wherein a first energy band gap of the first region is smaller than a second energy band gap of the second region, and wherein a third energy band gap of the pocket region is different from the first energy band gap and the second energy band gap.
地址 Suwon-si KR