METHOD AND SYSTEM FOR WRITING NANOSCALE PATTERNS

摘要

A method of performing nanolithography is disclosed, comprising use of an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light directed onto a data recording medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a data recording medium. A data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures.

主权项

1. A method for patterning a data recording medium, comprising:
bringing a at least one plasmonic structure in close proximity to data recording medium; moving the data recording medium relative to the plasmonic structure; and illuminating a portion of the data recording medium using photons, such that the photon illumination intensity is affected by the plasmonic structure.