NOVEL TRISILYL AMINE DERIVATIVE, METHOD FOR MANUFACTURING THEREOF AND SILICON-CONTAINING THIN FILM USE THE SAME

摘要

The present invention relates to a novel trisilyl amine derivative, a method for producing the same, and a thin film containing silicon produced by using the same. The trisilyl amine derivative of the present invention, which is a compound having thermal stability, high volatility, and high reactivity and being present in a liquid state at room temperature and under pressure where handling is possible, may form a high purity silicon-containing thin film having excellent physical and electrical properties by various deposition methods.