发明名称 ORGANIC BOTTOM ANTIREFLECTIVE COATING COMPOSITION FOR NANOLITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To provide an anti-reflective coating composition for preventing a pull-back phenomenon, in which an anti-reflective coating layer tears on a corner of a pattern of a substrate during a heat curing process, and improving gap-filling performance of the pattern.SOLUTION: An anti-reflective coating composition comprises (a) a polymer and (b) a solvent. The polymer comprises (a-1) at least one unit derived from a compound having an aromatic group and constituting the main chain of the polymer, and (a-2) a unit derived from a crosslinker and attached to the main chain. The content of the crosslinker that has not attached to the main chain of the polymer is greater than 0 wt.% and less than or equal to 5 wt.% based on the total weight of solid content in the composition.
申请公布号 JP2015129937(A) 申请公布日期 2015.07.16
申请号 JP20150000578 申请日期 2015.01.05
申请人 ROHM & HAAS ELECTRONIC MATERIALS KOREA LTD 发明人 SIM JAE HWAN;KIM SO-YEON;JO JUNG KYU;LEE HYE-WON;KANG JIHOON;LIM JAE-BONG;YUN JUN-HAN
分类号 G03F7/11;H01L21/027 主分类号 G03F7/11
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