METHOD OF MANUFACTURING DISPLAY DEVICE AND METHOD OF MANUFACTURING THIN-FILM TRANSISTOR

摘要

PROBLEM TO BE SOLVED: To obtain a display device with high definition and a high aperture ratio.SOLUTION: A method of manufacturing a display device according to one embodiment includes a process of forming a thin-film transistor on an insulating substrate. The process of forming the thin-film transistor includes: forming an oxide semiconductor layer above the insulating substrate; forming a gate insulating layer above the oxide semiconductor layer; forming a gate electrode above the oxide semiconductor layer with the gate insulating layer sandwiched therebetween; and irradiating the oxide semiconductor layer with laser light from above the gate electrode and the gate insulating layer, thereby making the resistances of a second region and a third region sandwiching a first region facing the gate electrode in the oxide semiconductor layer lower than that of the first region.