显示装置制造用相偏移光罩基底、显示装置制造用相偏移光罩及其制造方法、以及显示装置之制造方法;PHASE-SHIFT MASK BLANK FOR DISPLAY DEVICE MANUFACTURE, PHASE-SHIFT MASK FOR DISPLAY DEVICE MANUFACTURE AND ITS MANUFACTURING METHOD, AND METHOD FOR MANUFACTURING DISPLAY DEVICE

摘要

本发明之目的在于提供一种包含显示针对曝光光之波长依存性受抑制之光学特性之相偏移膜的装置制造用之相偏移光罩基底。;本发明之相偏移光罩基底1系包含：透明基板2、及形成于该透明基板2上之相偏移膜3。相偏移膜3系包含至少具有一层含金属与矽、氮及/或氧之任一元素之金属矽化物系材料层之单层膜或积层膜。相偏移膜3其波长365nm之透射率为3.5%以上8%以下之范围，波长365nm之相差为160度以上200度以下之范围，波长365nm以上436nm以下之范围内透射率之依存于波长之变化量为5.5%以内。;SOLUTION: A phase-shift mask blank 1 comprises a transparent substrate 2, and a phase-shift film 3 formed on the transparent substrate 2. The phase-shift film 3 comprises a monolayer film or laminated film comprising at least one metal silicide material layer including metal, silicon, and either one element of nitrogen and/or oxygen. In the phase-shift film 3, transmittance at a wavelength of 365nm is between 3.5% and 8% inclusive, phase difference at a wavelength of 365nm is between 160 degrees and 200 degrees inclusive, and wavelength-dependent variation of transmittance within a wavelength range between 365nm and 436nm inclusive is within 5.5%.