发明名称 SPIN COATABLE METALLIC HARD MASK COMPOSITIONS AND PROCESSES THEREOF
摘要 The present invention relates to a novel spin coatable composition comprising (a) metallosilicic acid; (b) at least one compound comprising two or more 4-hydroxyphenyl groups; and, c) a solvent. The component b) can be a 4-hydroxyphenyl compound of structure (I) wherein W is a linking group chosen from the group consisting of an organic linking moiety, a heteroatom containing linking moiety and a direct valence bond, m is a positive integer of 1 and n is a positive integer equal to 1 or and Ri, Rii, Riii and Riv are independently chosen substituents from a group consisting of hydrogen, (C1-C6) alkyl, (C1-C6) alkoxy, (C6-C20) aryl, halides (such as Cl, I, F), hydroxyl, alkylcarbonyl (alkyl-C(═O)—), alkylcarbonyloxy (alkyl-C(═O)—O—), alkyloxycarbonyl (alkyl-O—C(═O)—), alkyloxycarbonyloxy (alkyl-O—C(═O)—O—) and mixtures of these; and a solvent.;;The present invention further relates to processes using the novel compositions.
申请公布号 US2015200090(A1) 申请公布日期 2015.07.16
申请号 US201414154929 申请日期 2014.01.14
申请人 AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. 发明人 CHADA Venkata Gopal Reddy;YAO Huirong;MULLEN Salem;WOLFER Elizabeth;DIOSES Alberto D.;CHO JoonYeon;PADMANABAN Munirathna
分类号 H01L21/02;H01L21/311 主分类号 H01L21/02
代理机构 代理人
主权项 1. A composition which is an admixture comprising; (a) metallosilicic acid; b) at least one compound comprising two or more 4-hydroxyphenyl groups; and, c) a solvent.
地址 Somerville NJ US