发明名称 液浸リソグラフィ装置、シャッター部材、および基板テーブル
摘要 <p>An immersion lithographic apparatus has a surface that in use is contacted by the immersion liquid and the surface has a surface roughness Ra that is less than or equal to 0.2μm. Immersion liquid on the surface may have a contact angle of 60° or greater. The surface may be able to maintain its properties so that immersion liquid on the surface may have the contact angle for a prolonged period of immersion in the immersion liquid.</p>
申请公布号 JP5748730(B2) 申请公布日期 2015.07.15
申请号 JP20120264036 申请日期 2012.12.03
申请人 发明人
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址
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