PLASMA PROCESSING APPARATUS, ABNORMALITY DETERMINATION METHOD, AND MICROWAVE GENERATOR

摘要

The purpose of the present invention is to properly determine whether adjustment of an oscillation frequency is a success. According to the present invention, a plasma processing apparatus comprises: a plasma producing device including a processing container and a microwave oscillator, and to generate plasma inside the processing container by using a microwave oscillated by the microwave oscillator; an adjusting part to adjust an oscillation frequency which is a frequency of a microwave oscillated by the microwave oscillator to a predetermined frequency; a detecting part to detect the oscillation frequency adjusted to the predetermined frequency by the adjusting part; and a determining part to determine whether it is success that an oscillation frequency is adjusted by the adjusting part by using the oscillation frequency detected by the detecting part or by using a parameter changed according to the difference between the oscillation frequency and the predetermined frequency.