| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of detecting biting of deposits into a gap between a substrate and a mask and preventing damage of a mask as well as maintaining high exposure accuracy.SOLUTION: An exposure apparatus 1 is provided with a mask 12 on which a pattern to be transferred to a substrate 2 is formed and transmits exposure light emitted from a light source 11 to expose the pattern on the substrate 2. The substrate 2 is moved in the scanning direction with respect to the mask 12 by a stage 10. The mask 12 is held by a mask holder 13 and the mask holder 13 is provided with an acceleration sensor 14. In addition, the acceleration sensor 14 detects the acceleration in a vertical direction of the mask 12. A determination part 16 determines whether the detection result exceeds a predetermined value, and based on the determination result, a control part 15 for controlling the stage 10 continues or stops movement of the substrate 2 by the stage 10. |
