发明名称 |
Physical vapor transport growth system for simultaneously growing more than one SiC single crystal, and method of growing |
摘要 |
The present invention relates to a configuration and in particular a physical vapor transport growth system for simultaneously growing more than one silicon carbide (SiC) bulk crystal. Furthermore, the invention relates to a method for producing such a bulk SiC crystal. A physical vapor transport growth system for simultaneously growing more than one SiC single crystal boule comprises according to the present invention comprises a crucible (102) containing two growth compartments (114A, 114B) comprising each at least one SiC seed crystal (106A, 106B) and a source material compartment (112) for containing a SiC source material (104). The source material compartment (112) is arranged symmetrically between said growth compartments (114A, 114B) and is separated from each of the growth compartments by a gas permeable porous membrane (116A, 116B; 116A', 116B'). |
申请公布号 |
EP2664695(B1) |
申请公布日期 |
2015.07.15 |
申请号 |
EP20120168341 |
申请日期 |
2012.05.16 |
申请人 |
SICRYSTAL AG |
发明人 |
STRAUBINGER, THOMAS;VOGEL, MICHAEL;WOHLFART, ANDREAS;SCHMITT, ERWIN |
分类号 |
C30B23/06;C30B23/00;C30B23/02;C30B29/36 |
主分类号 |
C30B23/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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