发明名称 Physical vapor transport growth system for simultaneously growing more than one SiC single crystal, and method of growing
摘要 The present invention relates to a configuration and in particular a physical vapor transport growth system for simultaneously growing more than one silicon carbide (SiC) bulk crystal. Furthermore, the invention relates to a method for producing such a bulk SiC crystal. A physical vapor transport growth system for simultaneously growing more than one SiC single crystal boule comprises according to the present invention comprises a crucible (102) containing two growth compartments (114A, 114B) comprising each at least one SiC seed crystal (106A, 106B) and a source material compartment (112) for containing a SiC source material (104). The source material compartment (112) is arranged symmetrically between said growth compartments (114A, 114B) and is separated from each of the growth compartments by a gas permeable porous membrane (116A, 116B; 116A', 116B').
申请公布号 EP2664695(B1) 申请公布日期 2015.07.15
申请号 EP20120168341 申请日期 2012.05.16
申请人 SICRYSTAL AG 发明人 STRAUBINGER, THOMAS;VOGEL, MICHAEL;WOHLFART, ANDREAS;SCHMITT, ERWIN
分类号 C30B23/06;C30B23/00;C30B23/02;C30B29/36 主分类号 C30B23/06
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